Moreau, Wayne M. : rechercher sur Z-Library

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Campagne de collecte 15 septembre 2024 – 1 octobre 2024

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1

State Of Art Of Acrylate Resists: An Overview Of Polymer Structure And Lithographic Performance

Moreau, Wayne M.

Journal:

Optical Engineering

Année:

1983

Langue:

english

Fichier:

PDF, 214 KB

english, 1983

2

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Deep-UV hardening of deep-UV resists

Jordhamo, George M., Moreau, Wayne M., Kunz, Roderick R.

Année:

1996

Langue:

english

Fichier:

PDF, 327 KB

english, 1996

3

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - Image collapse issues in photoresist

Simons, John P., Goldfarb, Dario L., Angelopoulos, Marie, Messick, Scott, Moreau, Wayne M., Robinson, Chris, de Pablo, Juan J., Nealey, Paul F., Houlihan, Francis M.

Année:

2001

Langue:

english

Fichier:

PDF, 755 KB

english, 2001

4

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Defect printing issues with high-contrast chemically amplified resists

Lu, Zhijian G., Moreau, Wayne M., Yin, Xiaoming, Chen, K. Rex, Thomas, Alan C., Lawson, Peggy, Jordhamo, George M., Wu, ChungHsi J., Houlihan, Francis M.

Année:

2000

Langue:

english

Fichier:

PDF, 1.31 MB

english, 2000

5

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VII - Kanagawa, Japan (Wednesday 12 April 2000)] Photomask and Next-Generation Lithography Mask Technology VII - CA resist with high sensitivity and sub-100-nm resolution for advanced mask making

Huang, Wu-Song, Kwong, Ranee W., Hartley, John G., Moreau, Wayne M., Angelopoulos, Marie, Magg, Christopher, Lawliss, Mark, Morimoto, Hiroaki

Année:

2000

Langue:

english

Fichier:

PDF, 2.38 MB

english, 2000

6

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - Sensitivity enhancers for chemically amplified resists

Brunsvold, William R., Kwong, Ranee W., Montgomery, Warren, Moreau, Wayne M., Sachdev, Harbans S., Welsh, Kevin M., Watts, Michael P. C.

Année:

1990

Langue:

english

Fichier:

PDF, 704 KB

english, 1990

7

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - High resolution patterning in chemically amplified resists: the effect of film thickness

Medeiros, David R., Moreau, Wayne M., Petrillo, Karen E., Chauhan, Maharshi, Huang, Wu-Song, Magg, Christopher, Goldfarb, Dario L., Angelopoulos, Marie, Nealey, Paul F., Houlihan, Francis M.

Année:

2001

Langue:

english

Fichier:

PDF, 539 KB

english, 2001

8

The synthesis and evaluation of cyclic olefin sulfone copolymers and terpolymers as electron beam resists

Edward Gipstein, Wayne Moreau, George Chiu, Omar U. Need III

Journal:

Journal of Applied Polymer Science

Année:

1977

Langue:

english

Fichier:

PDF, 734 KB

english, 1977

9

Object-oriented graphical information systems: Research plan and evaluation metrics

Dennis R. Moreau, Wayne D. Dominick

Journal:

Journal of Systems and Software

Année:

1989

Langue:

english

Fichier:

PDF, 775 KB

english, 1989

10

Charge Transfer Properties of dl-Thioctic Acid and Other Disulphides

MOREAU, WAYNE M., WEISS, KARL

Journal:

Année:

1965

Fichier:

PDF, 122 KB

1965

11

A new ovine Babesia species transmitted by Hyalomma anatolicum anatolicum

Guiquan Guan, Miling Ma, Emmanuelle Moreau, Junlong Liu, Bingyi Lu, Qi Bai, Jianxun Luo, Wayne Jorgensen, Alain Chauvin, Hong Yin

Journal:

Experimental Parasitology

Année:

2009

Langue:

english

Fichier:

PDF, 393 KB

english, 2009

12

TG2, the missing link in the development of vascular stiffness?

Simon Moreau, Nicolas Chabot, Jeffrey Wayne Keillor, Pierre Moreau

Journal:

Année:

2008

Langue:

english

Fichier:

PDF, 74 KB

english, 2008

13

A microcomputer-based interactive presentation development system

Moreau, Dennis R., Dominick, Wayne D.

Journal:

Computers & Education

Année:

1988

Langue:

english

Fichier:

PDF, 1009 KB

english, 1988

14

Charge-Transfer Complexes of Disulfides with Tetracyanoethylene

Moreau, Wayne M., Weiss, Karl

Journal:

Journal of the American Chemical Society

Année:

1966

Langue:

english

Fichier:

PDF, 861 KB

english, 1966

15

Transfer apparatus for degassed solutions

Moreau, Wayne M., Tyler, Theodore A., Weiss, Karl

Journal:

Journal of Chemical Education

Année:

1966

Langue:

english

Fichier:

PDF, 629 KB

english, 1966

16

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Emerging Lithographic Technologies - Conducting polyaniline coatings for submicron lithography and SEM metrology

Graham, Teresita O., Angelopoulos, Marie, Furman, Bruce, Chen, K. Rex, Moreau, Wayne M., Seeger, David E.

Année:

1997

Langue:

english

Fichier:

PDF, 1.19 MB

english, 1997

17

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Properties and performance of near-UV reflectivity control layers (RCL)

Lynch, Thomas J., Paradis, Valerie R., Spak, Mark A., Moreau, Wayne M., Nalamasu, Omkaram

Année:

1994

Langue:

english

Fichier:

PDF, 412 KB

english, 1994

18

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Acid diffusion in a chemically amplified negative i-line photoresist

Connolly, Judy, Chen, K. Rex, Kwong, Ranee W., Lawson, Margaret C., Linehan, Leo L., Moreau, Wayne M.

Année:

1998

Langue:

english

Fichier:

PDF, 1.71 MB

english, 1998

19

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Polymer-bound sensitizer in i-line resist formulations

Jagannathan, Premlatha, DeWan, Charlotte, Eckert, Andrew R., Mih, Rebecca D., Martinek, Kathleen, Richwine, Charles, Linehan, Leo L., Moreau, Wayne M., Smith, Randolph S.

Année:

1998

Langue:

english

Fichier:

PDF, 2.94 MB

english, 1998

20

A New High Performance CA Resist for E-beam Lithography

Kwong, Ranee, Huang, Wu-Song, Moreau, Wayne, Lang, Robert, Robinson, Christopher, Medeiros, David R., Aviram, Ari, Guarnieri, Richard C., Angelopoulos, Marie

Journal:

MRS Proceedings

Année:

1999

Langue:

english

Fichier:

PDF, 898 KB

english, 1999

21

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Design of a bottom antireflective layer for optical lithography

Fahey, James T., Moreau, Wayne M., Welsh, Kevin M., Miura, Steve S., Eib, Nicholas K., Spinillo, Gary T., Sturtevant, John L., Nalamasu, Omkaram

Année:

1994

Langue:

english

Fichier:

PDF, 1.04 MB

english, 1994

22

SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Advances in Resist Technology and Processing XII - New positive-tone deep-UV photoresist based on poly(4-hydroxystyrene) and an acid labile protecting group

Fahey, James T., Conley, Will, Brunsvold, William R., Yang, Dominic C., Moreau, Wayne M., Jordhamo, George M., Pratt, Steve, Crockatt, Dale M., Hefferon, George J., Wood, Robert L., Allen, Robert D.

Année:

1995

Langue:

english

Fichier:

PDF, 621 KB

english, 1995

23

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology X - Yokohama, Japan (Wednesday 16 April 2003)] Photomask and Next-Generation Lithography Mask Technology X - Current developments of a high-performance CA resist for mask-making application

Huang, Wu-Song, Tanabe, Hiroyoshi, He, Wei, Li, Wenjie, Moreau, Wayne M., Lang, Robert, Medeiros, David R., Petrillo, Karen E., Mahorowala, Arpan P., Angelopoulos, Marie, Deverich, Christina, Huang, C

Année:

2003

Langue:

english

Fichier:

PDF, 359 KB

english, 2003

24

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology IX - Yokohama, Japan (Tuesday 23 April 2002)] Photomask and Next-Generation Lithography Mask Technology IX - Early mask results of KRS-XE and current progress in improving sensitivity and etch resistance

Deverich, Christina, Watts, Andrew J., Rabidoux, Paul A., Cardinali, Thomas J., Aaskov, William A., Levin, Peter, Huang, Wu-Song, Moreau, Wayne M., Angelopoulos, Marie, Petrillo, Karen E., Madeiros, D

Année:

2002

Langue:

english

Fichier:

PDF, 388 KB

english, 2002

25

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VIII - Kanagawa, Japan (Wednesday 25 April 2001)] Photomask and Next-Generation Lithography Mask Technology VIII - High-performance e-beam resist coupling excellent dry etch resistance and sub-100-nm resolution for advanced mask making

Huang, Wu-Song, Kwong, Ranee W., Moreau, Wayne M., Lang, Robert, Robinson, Christopher F., Medeiros, David R., Petrillo, Karen E., Aviram, Ari, Mahorowala, Arpan P., Angelopoulos, Marie, Magg, Christo

Année:

2001

Langue:

english

Fichier:

PDF, 993 KB

english, 2001

26

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Sensitivity factors of CAR electron-beam resists

Medeiros, David R., Petrillo, Karen E., Breyta, Gregory, Huang, Wu-Song, Moreau, Wayne M., Fedynyshyn, Theodore H.

Année:

2002

Langue:

english

Fichier:

PDF, 481 KB

english, 2002

27

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Reactive ion etch studies of DUV resists

Kwong, Ranee W., Moreau, Wayne M., Yan, Wendy, Conley, Will

Année:

1999

Langue:

english

Fichier:

PDF, 637 KB

english, 1999

28

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Applicaton of blends and side chain Si-O copolymers as high-etch-resistant sub-100-nm e-beam resists

Huang, Wu-Song, Kwong, Ranee W., Moreau, Wayne M., Lang, Robert, Medeiros, David R., Petrillo, Karen E., Mahorowala, Arpan P., Angelopoulos, Marie, Lin, Qinghuang, Dai, Junyan, Ober, Christopher K., F

Année:

2002

Langue:

english

Fichier:

PDF, 505 KB

english, 2002

29

SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Advances in Resist Technology and Processing XII - Investigation into the origin of microbridging in chemically amplified negative-tone photoresists

Linehan, Leo L., Smith, Randolph S., Dorn, Judy, Fahey, James T., Moreau, Wayne M., Spinillo, Gary T., Puttlitz, Erik A., Collins, James P., Allen, Robert D.

Année:

1995

Langue:

english

Fichier:

PDF, 769 KB

english, 1995

30

SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Advances in Resist Technology and Processing XII - Shot-size reduction of photoresist formulations

Moreau, Wayne M., Cornett, Kathleen M., Fahey, James T., Linehan, Leo L., Montgomery, Warren, Plat, Marina V., Smith, Randolph S., Wood, Robert L., Allen, Robert D.

Année:

1995

Langue:

english

Fichier:

PDF, 324 KB

english, 1995

31

SPIE Proceedings [SPIE Photomask Technology 2002 - Monterey, CA (Tuesday 1 October 2002)] 22nd Annual BACUS Symposium on Photomask Technology - Enhancement of KRS-XE for 50 keV Advanced Mask Making Applications

Petrillo, Karen E., Medeiros, David R., Bucchignano, Jim, Angelopoulos, Marie, Goldfarb, Dario L., Huang, Wu-Song, Moreau, Wayne M., Lang, Robert, Huang, Chester, Deverich, Christina, Cardinali, Thoma

Année:

2002

Langue:

english

Fichier:

PDF, 1.05 MB

english, 2002

32

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Dissolution behavior of novolak resins

Chen, K. Rex, Jordhamo, George M., Moreau, Wayne M., Kunz, Roderick R.

Année:

1996

Langue:

english

Fichier:

PDF, 278 KB

english, 1996

33

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Emerging Lithographic Technologies V - High-performance e-beam resist coupling excellent dry etch resistance and sub-100-nm resolution for advanced mask and device making

Huang, Wu-Song, Kwong, Ranee W., Moreau, Wayne M., Lang, Robert, Robinson, Christopher F., Medeiros, David R., Petrillo, Karen E., Aviram, Ari, Mahorowala, Arpan P., Angelopoulos, Marie, Magg, Christo

Année:

2001

Langue:

english

Fichier:

PDF, 808 KB

english, 2001

34

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - Thermal stability of naphthodiazoquinone sensitizers

Moreau, Wayne M., Tarascon-Auriol, Regine G.

Année:

1997

Langue:

english

Fichier:

PDF, 335 KB

english, 1997

35

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Emerging Lithographic Technologies IV - CA resist with high sensitivity and sub-100-nm resolution for advanced mask and device making

Kwong, Ranee W., Huang, Wu-Song, Hartley, John G., Moreau, Wayne M., Robinson, Christopher F., Angelopoulos, Marie, Magg, Christopher, Lawliss, Mark, Dobisz, Elizabeth A.

Année:

2000

Langue:

english

Fichier:

PDF, 1.80 MB

english, 2000

36

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - Negative tone aqueous developable resist for photon, electron, and x-ray lithography

Conley, Will, Moreau, Wayne M., Perreault, Stanley, Spinillo, Gary T., Wood, Robert L., Gelorme, Jeffrey D., Martino, Ronald M., Watts, Michael P. C.

Année:

1990

Langue:

english

Fichier:

PDF, 1012 KB

english, 1990

37

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Benzyloxypropene-protected PHS resist system for e-beam applications

Huang, Wu-Song, Kwong, Ranee W., Moreau, Wayne M., Chace, Mark, Lee, Kim Y., Hu, C. K., Medeiros, David R., Angelopoulos, Marie, Conley, Will

Année:

1999

Langue:

english

Fichier:

PDF, 1.94 MB

english, 1999

38

SPIE Proceedings [SPIE 18th Annual BACUS Symposium on Photomask Technology and Management - Redwood City, CA (Wednesday 16 September 1998)] 18th Annual BACUS Symposium on Photomask Technology and Management - High-contrast positive resists for e-beam mask making

Huang, Wu-Song, Kwong, Ranee W., Moreau, Wayne M., Angelopoulos, Marie, Bucchiagnano, Jim, Petrillo, Karen E., Ito, Hiroshi, Grenon, Brian J., Abboud, Frank E.

Année:

1998

Langue:

english

Fichier:

PDF, 598 KB

english, 1998

39

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - Fluorescence detection of photoacid in chemically amplified resists

Eckert, Andrew R., Moreau, Wayne M., Tarascon-Auriol, Regine G.

Année:

1997

Langue:

english

Fichier:

PDF, 922 KB

english, 1997

40

SPIE Proceedings [SPIE Photomask 2001 - Monterey, CA (Wednesday 3 October 2001)] 21st Annual BACUS Symposium on Photomask Technology - Extending the performance of KRS-XE for high-throughput electron-beam lithography for advanced mask making

Medeiros, David R., Petrillo, Karen E., Bucchignano, James, Angelopoulos, Marie, Huang, Wu-Song, Li, Wenjie, Moreau, Wayne M., Lang, Robert, Kwong, Ranee W., Magg, Christopher, Ashe, Brian, Dao, Giang

Année:

2002

Langue:

english

Fichier:

PDF, 255 KB

english, 2002

41

SPIE Proceedings [SPIE 1982 Microlithography Conferences - Santa Clara (Friday 1 January 1982)] Submicron Lithography I - State Of The Art Of Acrylate Resists: An Overview Of Polymer Structure And Lithographic Performance

Moreau, Wayne M., Blais, Phillip D.

Année:

1982

Langue:

english

Fichier:

PDF, 175 KB

english, 1982

42

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Acid amplifiers: proton transfer or direct acid formation

Huang, Wu-Song, Houlihan, Francis M., Kwong, Ranee W., Moreau, Wayne M.

Année:

2000

Langue:

english

Fichier:

PDF, 473 KB

english, 2000

43

SPIE Proceedings [SPIE Photomask 2001 - Monterey, CA (Wednesday 3 October 2001)] 21st Annual BACUS Symposium on Photomask Technology - Use of KRS-XE positive chemically amplified resist for optical mask manufacturing

Ashe, Brian, Dao, Giang T., Grenon, Brian J., Deverich, Christina, Rabidoux, Paul A., Peck, Barbara, Petrillo, Karen E., Angelopoulos, Marie, Huang, Wu-Song, Moreau, Wayne M., Medeiros, David R.

Année:

2001

Langue:

english

Fichier:

PDF, 611 KB

english, 2001

44

Tocopherols and Tocotrienols in Barley Oil Prepared from Germ and Other Fractions from Scarification and Sieving of Hulless Barley

Moreau, Robert A., Wayns, Kevin E., Flores, Rolando A., Hicks, Kevin B.

Journal:

Cereal Chemistry

Année:

2007

Langue:

english

Fichier:

PDF, 187 KB

english, 2007

45

A baseline assessment of emerging organic contaminants in New Zealand groundwater

Moreau, Magali, Hadfield, John, Hughey, John, Sanders, Fiona, Lapworth, Dan J., White, Debbie, Civil, Wayne

Journal:

Science of The Total Environment

Année:

2019

Fichier:

PDF, 1.00 MB

2019

46

Microbiologically influenced corrosion of stainless steel by sulfate reducing bacteria Ã¢ÂÂ A tale of caution

Javed, Muhammad Awais, Neil, Wayne, McAdam, Grant, Moreau, John, Wade, Scott

Journal:

Année:

2020

Fichier:

PDF, 5.09 MB

2020